Quantum Dot and Nanowire Nanoelectronics, Paul R. Berger

Also see The OSU Nanoscale Patterning Laboratory.

Advisor: Paul R. Berger Students: Si-Young Park (ECE Ph.D. candidate) Collaborators: Phillip E. Thompson (Naval Research Laboratory) Ilesanmi Adesida (University of Illinois at Urbana-Champaign) Patrick J. Fay (University of Notre Dame) Gregory L. Snider (University of Notre Dame) Alexei O. Orlov (University of Notre Dame) Roger Lake (University of California at Riverside) Former Graduate Students: Ronghua Yu (Physics Ph.D. 2007) Si-Young Park (Master's Thesis 2006) Sung-Yong Chung (Master's Thesis 2002, Ph.D. 2005) Sandro Di Giacomo (Master's Thesis 2005) Niu Jin (Ph.D. 2004)

Importance of the Problem:

Continued scaling of CMOS transistors is expected to reach diminishing returns in the years to come. More more background information, see:

• IEEE Spectrum: "Quantum Transistors: Towards Quantum Computing" (September 2000)
• IEEE Spectrum: "The Amazing Vanishing Transistor Act" (October 2002)

Brief Description of Our Work and Results:

Under construction.

Awards and Citations

• NSF Nanoscale Interdisciplinary Research Team (NIRT) award ($1.6M, 2001-2007).

Patents

• "Self-Aligned and Self-Limited Quantum Dot Nanoswitches and Methods Making Same," Paul R. Berger, [Disclosure submitted on November 2002; provisional filed August 2002; full patent filed August 27, 2003]. U. S. Patent #7,015,497, Granted on March 21, 2006.

Publications

1. "Synthesis, Characterization, and Electrical Properties of Individual Au-NiO-Au Heterojunction Nanowires," Jason S. Tresback, Alexander L. Vasiliev, Nitin P. Padture, Si-Young Park, and Paul R. Berger, IEEE Transactions on Nanotechnology, 6, pp. 676-681 (November 2007). PDF (1921 kB)

2. "Nanometer-Period Gratings in Hydrogen Silsesquioxane Fabricated by Electron Beam Lithography," Michael J. Word, Ilesanmi Adesida, and Paul R. Berger, Rapid Communications in Journal of Vacuum Science and Technology B , 21 , pp. L12-L15 (November/December 2003). PDF (603 kB)

Conference Presentations

1. "30-nm Period Gratings in Hydrogen Silsesquioxane Resist Fabricated by Electron-Beam Lithography," M. J. Word, P. Berger,and I. Adesida, 2003 Electronic Materials Conference (EMC) in Salt Lake City, UT (June 2003).

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